Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Three dimensional finite element analysis of the evolution of voids and thin films by strain and electromigration induced surface diffusion
Three dimensional finite element analysis of the evolution of voids and thin films by strain and electromigration induced surface diffusion
Three dimensional finite element analysis of the evolution of voids and thin films by strain and electromigration induced surface diffusion
Zhang, Y. W. (Autor:in) / Bower, A. F. (Autor:in) / Xia, L. (Autor:in) / Shih, C. F. (Autor:in)
JOURNAL OF THE MECHANICS AND PHYSICS OF SOLIDS ; 47 ; 173-199
01.01.1999
27 pages
Aufsatz (Zeitschrift)
Englisch
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
A simulation of asymmetrical voids evolution induced by electromigration
British Library Online Contents | 2000
|Three-dimensional Monte Carlo simulations of electromigration in polycrystalline thin films
British Library Online Contents | 2000
|Three-dimensional model for electromigration induced evolution of flip chip solder joints
British Library Online Contents | 2009
|Three-dimensional stress-strain finite element analysis of high rockfill dam
British Library Conference Proceedings | 1997
|In Situ SEM Observations of Electromigration Voids in Al Lines under Passivation
British Library Online Contents | 1994
|