Atomistic modeling of dopant implantation and annealing in Si: damage evolution, dopant diffusion and activation

Pelaz, L. / Marqués, L. A. / Aboy, M. et al. | British Library Online Contents | 2005

Ion implantation of silicon wafers for defect-reduced doped layer formation with low dopant atom diffusion

Shigenaka, N. / Ono, S. / Hashimoto, T. et al. | British Library Online Contents | 1994

Enhanced Dopant Diffusion Effects in 4H Silicon Carbide

Phelps, G. J. / Wright, N. G. / Chester, E. G. et al. | British Library Online Contents | 2002

Atomistic insights into Li-ion diffusion in amorphous silicon

Yan, Xin / Gouissem, Afif / Sharma, Pradeep | British Library Online Contents | 2015

Dopant Diffusion and Stacking Fault in Silicon During Thermal Oxidation

Okino, T. / Takaue, R. / Onishi, M. | British Library Online Contents | 1995