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Changes in preferred orientation of Pt thin films deposited by dc magnetron sputtering using Ar/O~2 gas mixtures
Changes in preferred orientation of Pt thin films deposited by dc magnetron sputtering using Ar/O~2 gas mixtures
Changes in preferred orientation of Pt thin films deposited by dc magnetron sputtering using Ar/O~2 gas mixtures
Min Hong Kim (Autor:in) / Park, T.-S. (Autor:in) / Yoon, E. (Autor:in) / Lee, D.-S. (Autor:in) / Park, D.-Y. (Autor:in) / Woo, H.-J. (Autor:in) / Chun, D.-I. (Autor:in) / Ha, J. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 1255-1260
01.01.1999
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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