Changes in preferred orientation of Pt thin films deposited by dc magnetron sputtering using Ar/O~2 gas mixtures: Fid-Bau Portal

Changes in preferred orientation of Pt thin films deposited by dc magnetron sputtering using Ar/O~2 gas mixtures

Min Hong Kim / Park, T.-S. / Yoon, E. / Lee, D.-S. / Park, D.-Y. / Woo, H.-J. / Chun, D.-I. / Ha, J.

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Changes in preferred orientation of Pt thin films deposited by dc magnetron sputtering using Ar/O~2 gas mixtures

Min Hong Kim / Park, T.-S. / Yoon, E. / Lee, D.-S. / Park, D.-Y. / Woo, H.-J. / Chun, D.-I. / Ha, J.

Changes in preferred orientation of Pt thin films deposited by dc magnetron sputtering using Ar/O~2 gas mixtures

Min Hong Kim / Park, T.-S. / Yoon, E. / Lee, D.-S. / Park, D.-Y. / Woo, H.-J. / Chun, D.-I. / Ha, J.

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Document information

Title:

Changes in preferred orientation of Pt thin films deposited by dc magnetron sputtering using Ar/O~2 gas mixtures

Contributors:

Min Hong Kim (author) / Park, T.-S. (author) / Yoon, E. (author) / Lee, D.-S. (author) / Park, D.-Y. (author) / Woo, H.-J. (author) / Chun, D.-I. (author) / Ha, J. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 1255-1260

Publication date:

1999-01-01

Size:

6 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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