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Comparison of (hexafluoroacetylacetonate)Cu(vinyltrimethyl-silane) and (hexafluoroacetylacetonate)Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copper
Comparison of (hexafluoroacetylacetonate)Cu(vinyltrimethyl-silane) and (hexafluoroacetylacetonate)Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copper
Comparison of (hexafluoroacetylacetonate)Cu(vinyltrimethyl-silane) and (hexafluoroacetylacetonate)Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copper
Park, M.-Y. (Autor:in) / Son, J.-H. (Autor:in) / Kang, S.-W. (Autor:in) / Rhee, S.-W. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 975-979
01.01.1999
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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