A platform for research: civil engineering, architecture and urbanism
Comparison of (hexafluoroacetylacetonate)Cu(vinyltrimethyl-silane) and (hexafluoroacetylacetonate)Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copper
Comparison of (hexafluoroacetylacetonate)Cu(vinyltrimethyl-silane) and (hexafluoroacetylacetonate)Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copper
Comparison of (hexafluoroacetylacetonate)Cu(vinyltrimethyl-silane) and (hexafluoroacetylacetonate)Cu(allyltrimethylsilane) for metalorganic chemical vapor deposition of copper
Park, M.-Y. (author) / Son, J.-H. (author) / Kang, S.-W. (author) / Rhee, S.-W. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 975-979
1999-01-01
5 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2000
|British Library Online Contents | 1994
|British Library Online Contents | 1998
|British Library Online Contents | 1996
|Amorphous gallium oxide nanowires synthesized by metalorganic chemical vapor deposition
British Library Online Contents | 2004
|