Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Micro-Raman study of stress distribution generated in silicon during proximity rapid thermal diffusion
Micro-Raman study of stress distribution generated in silicon during proximity rapid thermal diffusion
Micro-Raman study of stress distribution generated in silicon during proximity rapid thermal diffusion
Nolan, M. (Autor:in) / Perova, T. (Autor:in) / Moore, R. A. (Autor:in) / Moore, C. J. (Autor:in) / Berwick, K. (Autor:in) / Gamble, H. S. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 73 ; 168 - 172
01.01.2000
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2018
|British Library Online Contents | 1997
|Raman measurement of stress distribution in multicrystalline silicon materials
British Library Online Contents | 2003
|Micro-Raman stress characterization of polycrystalline silicon films grown at high temperature
British Library Online Contents | 2004
|Micro-Raman investigation of stress distribution in laser drilled via structures
British Library Online Contents | 2009
|