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Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process
Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process
Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process
Martensson, P. (Autor:in) / Larsson, K. (Autor:in) / Carlsson, J. O. (Autor:in)
APPLIED SURFACE SCIENCE ; 157 ; 92-100
01.01.2000
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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