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Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process

Martensson, P. / Larsson, K. / Carlsson, J. O.

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Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process

Martensson, P. / Larsson, K. / Carlsson, J. O.

Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process

Martensson, P. / Larsson, K. / Carlsson, J. O.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H2 process

Contributors:

Martensson, P. (author) / Larsson, K. (author) / Carlsson, J. O. (author)

Published in:

APPLIED SURFACE SCIENCE ; 157 ; 92-100

Publication date:

2000-01-01

Size:

9 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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