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Comparison of Mechanical and Chemomechanical Polished SiC Wafers Using Photon Backscattering
Comparison of Mechanical and Chemomechanical Polished SiC Wafers Using Photon Backscattering
Comparison of Mechanical and Chemomechanical Polished SiC Wafers Using Photon Backscattering
Mitchel, W. C. (Autor:in) / Brown, J. (Autor:in) / Buckanan, D. (Autor:in) / Bertke, R. (Autor:in) / Malalingham, K. (Autor:in) / Orazio, F. D. (Autor:in) / Pirouz, P. (Autor:in) / Tseng, H.-J. R. (Autor:in) / Ramabadran, U. B. (Autor:in) / Roughani, B. (Autor:in)
MATERIALS SCIENCE FORUM ; 338/342 ; 841-844
01.01.2000
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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