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Formation of silicon dioxide layers during UV annealing of tantalum pentoxide film
Formation of silicon dioxide layers during UV annealing of tantalum pentoxide film
Formation of silicon dioxide layers during UV annealing of tantalum pentoxide film
Zhang, J. Y. (Autor:in) / Boyd, I. W. (Autor:in)
APPLIED SURFACE SCIENCE ; 168 ; 312-315
01.01.2000
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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