Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Deposition and annealing of tantalum pentoxide films using 172 nm excimer lamp
Deposition and annealing of tantalum pentoxide films using 172 nm excimer lamp
Deposition and annealing of tantalum pentoxide films using 172 nm excimer lamp
Zhang, J. Y. (Autor:in) / Lim, B. (Autor:in) / Boyd, I. W. (Autor:in)
APPLIED SURFACE SCIENCE ; 154-155 ; 382-386
01.01.2000
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Photo-deposition of tantalum pentoxide film using 222 nm excimer lamps
British Library Online Contents | 2000
|Growth of tantalum pentoxide film by pulsed laser deposition
British Library Online Contents | 1999
|Deposition of tantalum oxide films by ArF excimer laser ablation
British Library Online Contents | 1998
|Formation of silicon dioxide layers during UV annealing of tantalum pentoxide film
British Library Online Contents | 2000
|British Library Online Contents | 2001
|