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Experiments for 3-D structuring of thick resists by gray tone lithography
Experiments for 3-D structuring of thick resists by gray tone lithography
Experiments for 3-D structuring of thick resists by gray tone lithography
Dumbravescu, N. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 3 ; 569-573
01.01.2000
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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