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Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains
Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains
Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains
Wu, H. (Autor:in) / Gonsalves, K. E. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 13 ; 670-672
01.01.2001
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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