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b-FeSi2-base MIS diodes fabricated by sputtering method
b-FeSi2-base MIS diodes fabricated by sputtering method
b-FeSi2-base MIS diodes fabricated by sputtering method
Ehara, T. (Autor:in) / Sasaki, Y. (Autor:in) / Saito, K. (Autor:in) / Nakagomi, S. (Autor:in) / Kokubun, Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 175-176 ; 96-100
01.01.2001
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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