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b-FeSi2 based metal-insulator-semiconductor devices formed by sputtering for optoelectronic applications
b-FeSi2 based metal-insulator-semiconductor devices formed by sputtering for optoelectronic applications
b-FeSi2 based metal-insulator-semiconductor devices formed by sputtering for optoelectronic applications
Ootsuka, T. (Autor:in) / Liu, Z. (Autor:in) / Osamura, M. (Autor:in) / Fukuzawa, Y. (Autor:in) / Otogawa, N. (Autor:in) / Nakayama, Y. (Autor:in) / Tanoue, H. (Autor:in) / Makita, Y. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 449-452
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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