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Modeling of electromechanically-induced failure of passivated metallic thin films used in device interconnections
Modeling of electromechanically-induced failure of passivated metallic thin films used in device interconnections
Modeling of electromechanically-induced failure of passivated metallic thin films used in device interconnections
Gungor, M. R. (Autor:in) / Maroudas, D. (Autor:in)
INTERNATIONAL JOURNAL OF FRACTURE ; 109 ; 47-68
01.01.2001
22 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.1126
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