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On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical process
On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical process
On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical process
Nagai, H. (Autor:in) / Inayoshi, M. (Autor:in) / Hori, M. (Autor:in) / Goto, T. (Autor:in) / Hiramatsu, M. (Autor:in)
APPLIED SURFACE SCIENCE ; 183 ; 284-289
01.01.2001
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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