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On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical process

Nagai, H. / Inayoshi, M. / Hori, M. / Goto, T. / Hiramatsu, M.

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On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical process

Nagai, H. / Inayoshi, M. / Hori, M. / Goto, T. / Hiramatsu, M.

On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical process

Nagai, H. / Inayoshi, M. / Hori, M. / Goto, T. / Hiramatsu, M.

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Check availability in my library

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Document information

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Document information

Title:

On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical process

Contributors:

Nagai, H. (author) / Inayoshi, M. (author) / Hori, M. (author) / Goto, T. (author) / Hiramatsu, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 183 ; 284-289

Publication date:

2001-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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