Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Low temperature epitaxial growth of germanium islands in active regions of silicon interband tunneling diodes
Low temperature epitaxial growth of germanium islands in active regions of silicon interband tunneling diodes
Low temperature epitaxial growth of germanium islands in active regions of silicon interband tunneling diodes
Dashiell, M. W. (Autor:in) / Muller, C. (Autor:in) / Jin-Phillipp, N. Y. (Autor:in) / Denker, U. (Autor:in) / Schmidt, O. G. (Autor:in) / Eberl, K. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 106 - 110
01.01.2002
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Low temperature, high growth rate epitaxial silicon and silicon germanium alloy films
British Library Online Contents | 2004
|British Library Online Contents | 2005
|Growth of epitaxial germanium-silicon heterostructures by chemical vapour deposition
British Library Online Contents | 1993
|