Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography

Tully, D. C. / Wilder, K. / Frechet, J. M. J. et al. | British Library Online Contents | 1999

Nanopatterning with UV Optical Lithography

Rothschild, M. / Bloomstein, T. M. / Efremow, N. et al. | British Library Online Contents | 2005

Patterning Mesoscale Gradient Structures with Self-Assembled Monolayers and Scanning Tunneling Microscopy Based Replacement Lithography

Fuierer, R. R. / Carroll, R. L. / Feldheim, D. L. et al. | British Library Online Contents | 2002

Local Probe Investigation of Self-Assembled Monolayers

Mizutani, W. / Anselmetti, D. / Michel, B. | Springer Verlag | 1993

Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning

Kim, B. H. / Shin, D. O. / Jeong, S. J. et al. | British Library Online Contents | 2008