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Reactive sputter deposition of highly oriented AlN films at room temperature
Reactive sputter deposition of highly oriented AlN films at room temperature
Reactive sputter deposition of highly oriented AlN films at room temperature
Iriarte, G. F. (Autor:in) / Engelmark, F. (Autor:in) / Katardjiev, I. V. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 17 ; 1469-1475
01.01.2002
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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