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Study on Deposition Rate of AlN Thin Films Using Reactive Magnetron Sputtering
Study on Deposition Rate of AlN Thin Films Using Reactive Magnetron Sputtering
Study on Deposition Rate of AlN Thin Films Using Reactive Magnetron Sputtering
Xiaohong, X. (Autor:in) / Haishun, W. (Autor:in) / Fuqiang, Z. (Autor:in)
RARE METAL MATERIALS AND ENGINEERING ; 31 ; 209-212
01.01.2002
4 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
669
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