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    Study on Deposition Rate of AlN Thin Films Using Reactive Magnetron Sputtering

    New search for: Xiaohong, X.
    New search for: Haishun, W.
    New search for: Fuqiang, Z.

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    Study on Deposition Rate of AlN Thin Films Using Reactive Magnetron Sputtering

    New search for: Xiaohong, X.
    New search for: Haishun, W.
    New search for: Fuqiang, Z.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Study on Deposition Rate of AlN Thin Films Using Reactive Magnetron Sputtering

    New search for: Xiaohong, X.
    New search for: Haishun, W.
    New search for: Fuqiang, Z.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Study on Deposition Rate of AlN Thin Films Using Reactive Magnetron Sputtering

    Contributors:

    Xiaohong, X. (author) / Haishun, W. (author) / Fuqiang, Z. (author)

    Published in:

    RARE METAL MATERIALS AND ENGINEERING ; 31 ; 209-212

    Publication date:

    2002-01-01

    Size:

    4 pages

    ISSN:

    1002-185X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  669

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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