Formation of wavelike microscopic topography on surface of semiconductor subjected to sputtering by a high-current ion beam: Fid-Bau Portal

Formation of wavelike microscopic topography on surface of semiconductor subjected to sputtering by a high-current ion beam

Grigor ev, A. I. / Shiryaev, S. O. / Belonozhko, D. F. / Golovanov, A. S.

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Formation of wavelike microscopic topography on surface of semiconductor subjected to sputtering by a high-current ion beam

Grigor ev, A. I. / Shiryaev, S. O. / Belonozhko, D. F. / Golovanov, A. S.

Formation of wavelike microscopic topography on surface of semiconductor subjected to sputtering by a high-current ion beam

Grigor ev, A. I. / Shiryaev, S. O. / Belonozhko, D. F. / Golovanov, A. S.

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Titel:

Formation of wavelike microscopic topography on surface of semiconductor subjected to sputtering by a high-current ion beam

Beteiligte:

Grigor ev, A. I. (Autor:in) / Shiryaev, S. O. (Autor:in) / Belonozhko, D. F. (Autor:in) / Golovanov, A. S. (Autor:in)

Erschienen in:

SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY C/C OF ELEKTRONNAIA OBRABOTKA MATERIALOV ; 26-30

Erscheinungsdatum:

01.01.2000

Format / Umfang:

5 pages

ISSN:

1068-3755

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.44 / 660.297

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