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Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique
Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique
Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique
Ferreira, I. (Autor:in) / Vilarinho, P. (Autor:in) / Fernandes, F. (Autor:in) / Fortunato, E. (Autor:in) / Martins, R. (Autor:in) / Vieira, T.
01.01.2002
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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