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Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique
Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique
Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique
Ferreira, I. (author) / Vilarinho, P. (author) / Fernandes, F. (author) / Fortunato, E. (author) / Martins, R. (author) / Vieira, T.
2002-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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