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The atomic processes of ultraviolet laser-induced etching of chlorinated silicon (1 1 1) surface
The atomic processes of ultraviolet laser-induced etching of chlorinated silicon (1 1 1) surface
The atomic processes of ultraviolet laser-induced etching of chlorinated silicon (1 1 1) surface
Amasuga, H. (Autor:in) / Nakamura, M. (Autor:in) / Mera, Y. (Autor:in) / Maeda, K. (Autor:in)
APPLIED SURFACE SCIENCE ; 197-198 ; 577-580
01.01.2002
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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