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Stoichiometric and non-stoichiometric films in the Si-O-N system: mechanical, electrical, and dielectric properties
Stoichiometric and non-stoichiometric films in the Si-O-N system: mechanical, electrical, and dielectric properties
Stoichiometric and non-stoichiometric films in the Si-O-N system: mechanical, electrical, and dielectric properties
Torrison, L. (Autor:in) / Tolle, J. (Autor:in) / Kouvetakis, J. (Autor:in) / Dey, S. K. (Autor:in) / Gu, D. (Autor:in) / Tsong, I. S. (Autor:in) / Crozier, P. A. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 97 ; 54-58
01.01.2003
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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