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Stoichiometric and non-stoichiometric films in the Si-O-N system: mechanical, electrical, and dielectric properties
Stoichiometric and non-stoichiometric films in the Si-O-N system: mechanical, electrical, and dielectric properties
Stoichiometric and non-stoichiometric films in the Si-O-N system: mechanical, electrical, and dielectric properties
Torrison, L. (author) / Tolle, J. (author) / Kouvetakis, J. (author) / Dey, S. K. (author) / Gu, D. (author) / Tsong, I. S. (author) / Crozier, P. A. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 97 ; 54-58
2003-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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