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Electrochemical reliability of plasma-polymerized cyclohexane films deposited on copper in microelectronic devices
Electrochemical reliability of plasma-polymerized cyclohexane films deposited on copper in microelectronic devices
Electrochemical reliability of plasma-polymerized cyclohexane films deposited on copper in microelectronic devices
Park, Z. T. (Autor:in) / Choi, Y. S. (Autor:in) / Kim, J. G. (Autor:in) / Boo, J. H. (Autor:in)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 22 ; 945-947
01.01.2003
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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