A platform for research: civil engineering, architecture and urbanism
Electrochemical reliability of plasma-polymerized cyclohexane films deposited on copper in microelectronic devices
Electrochemical reliability of plasma-polymerized cyclohexane films deposited on copper in microelectronic devices
Electrochemical reliability of plasma-polymerized cyclohexane films deposited on copper in microelectronic devices
Park, Z. T. (author) / Choi, Y. S. (author) / Kim, J. G. (author) / Boo, J. H. (author)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 22 ; 945-947
2003-01-01
3 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Plasma-polymerized thiophene films for corrosion protection in microelectronic devices
British Library Online Contents | 2002
|Electrochemical evaluation of the reliability of plasma-polymerized methylcyclohexane films
British Library Online Contents | 2010
|Electrochemical polishing of copper for microelectronic applications
British Library Online Contents | 2003
|Plasma polymerized ferocenne-pyrrole copolymer films
British Library Online Contents | 2005
|Plasma-Polymerized C~6~0 Films
British Library Online Contents | 2001
|