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    Electrochemical reliability of plasma-polymerized cyclohexane films deposited on copper in microelectronic devices

    New search for: Park, Z. T.
    New search for: Choi, Y. S.
    New search for: Kim, J. G.
    New search for: Boo, J. H.

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    Electrochemical reliability of plasma-polymerized cyclohexane films deposited on copper in microelectronic devices

    New search for: Park, Z. T.
    New search for: Choi, Y. S.
    New search for: Kim, J. G.
    New search for: Boo, J. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electrochemical reliability of plasma-polymerized cyclohexane films deposited on copper in microelectronic devices

    New search for: Park, Z. T.
    New search for: Choi, Y. S.
    New search for: Kim, J. G.
    New search for: Boo, J. H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Electrochemical reliability of plasma-polymerized cyclohexane films deposited on copper in microelectronic devices

    Contributors:

    Park, Z. T. (author) / Choi, Y. S. (author) / Kim, J. G. (author) / Boo, J. H. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 22 ; 945-947

    Publication date:

    2003-01-01

    Size:

    3 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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