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Influence of the Plasma Condition on the Morphology of Vertically Aligned Carbon Nanotube Films Grown by RF Plasma Chemical Vapor Deposition
Influence of the Plasma Condition on the Morphology of Vertically Aligned Carbon Nanotube Films Grown by RF Plasma Chemical Vapor Deposition
Influence of the Plasma Condition on the Morphology of Vertically Aligned Carbon Nanotube Films Grown by RF Plasma Chemical Vapor Deposition
Ikuno, T. (Autor:in) / Takahashi, S. (Autor:in) / Kamada, K. (Autor:in) / Ohkura, S. (Autor:in) / Honda, S.-I. (Autor:in) / Katayama, M. (Autor:in) / Hirao, T. (Autor:in) / Oura, K. (Autor:in)
SURFACE REVIEW AND LETTERS ; 10 ; 611-616
01.01.2003
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
530.417
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