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Gas cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction
Gas cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction
Gas cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction
Li, X. (Autor:in) / Goodhue, W. D. (Autor:in) / Santeufeimio, C. (Autor:in) / Tetreault, T. G. (Autor:in) / MacCrimmon, R. (Autor:in) / Allen, L. P. (Autor:in) / Bliss, D. (Autor:in) / Krishnaswami, K. (Autor:in) / Sung, C. (Autor:in)
APPLIED SURFACE SCIENCE ; 218 ; 251-258
01.01.2003
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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