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Gas cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction
Gas cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction
Gas cluster ion beam processing of gallium antimonide wafers for surface and sub-surface damage reduction
Li, X. (author) / Goodhue, W. D. (author) / Santeufeimio, C. (author) / Tetreault, T. G. (author) / MacCrimmon, R. (author) / Allen, L. P. (author) / Bliss, D. (author) / Krishnaswami, K. (author) / Sung, C. (author)
APPLIED SURFACE SCIENCE ; 218 ; 251-258
2003-01-01
8 pages
Article (Journal)
English
DDC:
621.35
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