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Growth of high quality epitaxial Si1-x-yGexCy layers by using chemical vapor deposition
Growth of high quality epitaxial Si1-x-yGexCy layers by using chemical vapor deposition
Growth of high quality epitaxial Si1-x-yGexCy layers by using chemical vapor deposition
Hallstedt, J. (Autor:in) / Suvar, E. (Autor:in) / Persson, P. O. (Autor:in) / Hultman, L. (Autor:in) / Wang, Y. B. (Autor:in) / Radamson, H. H. (Autor:in)
APPLIED SURFACE SCIENCE ; 224 ; 46-50
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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