Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O
TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O
TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O
Ferguson, J. D. (Autor:in) / Yoder, A. R. (Autor:in) / Weimer, A. W. (Autor:in) / George, S. M. (Autor:in)
APPLIED SURFACE SCIENCE ; 226 ; 393-404
01.01.2004
12 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism
British Library Online Contents | 2001
|Superhydrophilicity of TiO2 thin films using TiCl4 as a precursor
British Library Online Contents | 2008
|Thermally stable Ag@ZrO2 core-shell via atomic layer deposition
British Library Online Contents | 2017
|Nanosized titania encapsulated silica particles using an aqueous TiCl4 solution
British Library Online Contents | 2005
|British Library Online Contents | 2016
|