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    TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O

    New search for: Ferguson, J. D.
    New search for: Yoder, A. R.
    New search for: Weimer, A. W.
    New search for: George, S. M.

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    TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O

    New search for: Ferguson, J. D.
    New search for: Yoder, A. R.
    New search for: Weimer, A. W.
    New search for: George, S. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O

    New search for: Ferguson, J. D.
    New search for: Yoder, A. R.
    New search for: Weimer, A. W.
    New search for: George, S. M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O

    Contributors:

    Ferguson, J. D. (author) / Yoder, A. R. (author) / Weimer, A. W. (author) / George, S. M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 226 ; 393-404

    Publication date:

    2004-01-01

    Size:

    12 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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