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Nanotopography impact in shallow-trench isolation chemical mechanical polishing-analysis method and consumable dependence
Nanotopography impact in shallow-trench isolation chemical mechanical polishing-analysis method and consumable dependence
Nanotopography impact in shallow-trench isolation chemical mechanical polishing-analysis method and consumable dependence
Park, J.-G. (Autor:in) / Katoh, T. (Autor:in) / Paik, U. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 19 ; 1783-1790
01.01.2004
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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