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Reactive Ion Etching of Silicon Carbide with Patterned Boron Implantation
Reactive Ion Etching of Silicon Carbide with Patterned Boron Implantation
Reactive Ion Etching of Silicon Carbide with Patterned Boron Implantation
Vassilevski, K. V. (Autor:in) / Hedley, J. (Autor:in) / Horsfall, A. B. (Autor:in) / Johnson, C. M. (Autor:in) / Wright, N. G. (Autor:in)
MATERIALS SCIENCE FORUM ; 457/460 ; 925-928
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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