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Edge Termination of SiC Schottky Diodes with Guard Rings Formed by High Energy Boron Implantation
Edge Termination of SiC Schottky Diodes with Guard Rings Formed by High Energy Boron Implantation
Edge Termination of SiC Schottky Diodes with Guard Rings Formed by High Energy Boron Implantation
Vassilevski, K. V. (Autor:in) / Horsfall, A. B. (Autor:in) / Johnson, C. M. (Autor:in) / Wright, N. G. (Autor:in)
MATERIALS SCIENCE FORUM ; 457/460 ; 989-992
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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