Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Towards High-Quality AlN/SiC Hetero-Interface by Controlling Initial Processes in Molecular-Beam Epitaxy
Towards High-Quality AlN/SiC Hetero-Interface by Controlling Initial Processes in Molecular-Beam Epitaxy
Towards High-Quality AlN/SiC Hetero-Interface by Controlling Initial Processes in Molecular-Beam Epitaxy
Onojima, N. (Autor:in) / Kaido, J. (Autor:in) / Suda, J. (Autor:in) / Kimoto, T. (Autor:in) / Matsunami, H. (Autor:in)
MATERIALS SCIENCE FORUM ; 457/460 ; 1569-1572
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Hetero-interface control and atomic layer epitaxy of SiC
British Library Online Contents | 1997
|High quality quantum dots fabricated by molecular beam epitaxy
British Library Online Contents | 1996
|British Library Online Contents | 2000
|First Principle Study on the Domain Matching Epitaxy Growth of Semiconductor Hetero-Interface
British Library Online Contents | 2008
|Nucleation during molecular beam epitaxy
British Library Online Contents | 1994
|