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Study of chemical dissolution of the barrier oxide layer of porous alumina films formed in oxalic acid using a re-anodizing technique
Study of chemical dissolution of the barrier oxide layer of porous alumina films formed in oxalic acid using a re-anodizing technique
Study of chemical dissolution of the barrier oxide layer of porous alumina films formed in oxalic acid using a re-anodizing technique
Vrublevsky, I. (Autor:in) / Parkoun, V. (Autor:in) / Sokol, V. (Autor:in) / Schreckenbach, J. (Autor:in)
APPLIED SURFACE SCIENCE ; 236 ; 270-277
01.01.2004
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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