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Analysis of chemical dissolution of the barrier layer of porous oxide on aluminum thin films using a re-anodizing technique
Analysis of chemical dissolution of the barrier layer of porous oxide on aluminum thin films using a re-anodizing technique
Analysis of chemical dissolution of the barrier layer of porous oxide on aluminum thin films using a re-anodizing technique
Vrublevsky, I. (Autor:in) / Parkoun, V. (Autor:in) / Sokol, V. (Autor:in) / Schreckenbach, J. (Autor:in)
APPLIED SURFACE SCIENCE ; 252 ; 227-233
01.01.2005
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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