Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Advances in surfactant-mediated growth of germanium on silicon: high-quality p-type Ge films on Si
Advances in surfactant-mediated growth of germanium on silicon: high-quality p-type Ge films on Si
Advances in surfactant-mediated growth of germanium on silicon: high-quality p-type Ge films on Si
Wietler, T. F. (Autor:in) / Ott, A. (Autor:in) / Bugiel, E. (Autor:in) / Hofmann, K. R. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 73-77
01.01.2005
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Tuning strain relaxation by surface morphology: Surfactant-mediated epitaxy of germanium on silicon
British Library Online Contents | 2008
|Germanium as a Possible Surfactant for Growth of Beta Silicon Carbide on Silicon Substrates
British Library Online Contents | 1998
|Low temperature, high growth rate epitaxial silicon and silicon germanium alloy films
British Library Online Contents | 2004
|British Library Online Contents | 2013
|Vapor-Liquid-Solid Growth of Silicon-Germanium Nanowires
British Library Online Contents | 2003
|