Germanium nanoislands formation on silicon oxide surface by molecular beam epitaxy

Nikiforov, A. I. / Ulyanov, V. V. / Pchelyakov, O. P. et al. | British Library Online Contents | 2005

Atomic layer epitaxy of germanium

Sugahara, S. / Kitamura, T. / Imai, S. et al. | British Library Online Contents | 1994

Residual strain in Ge films grown by surfactant-mediated epitaxy on Si(111) and Si(001) substrates

Wietler, T. F. / Bugiel, E. / Hofmann, K. R. | British Library Online Contents | 2006

Advances in surfactant-mediated growth of germanium on silicon: high-quality p-type Ge films on Si

Wietler, T. F. / Ott, A. / Bugiel, E. et al. | British Library Online Contents | 2005

Modeling of germanium atomic-layer-epitaxy

Sugahara, S. / Matsumura, M. | British Library Online Contents | 1997