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Application of plasma oxidation to strained-Si/SiGe MOSFET
Application of plasma oxidation to strained-Si/SiGe MOSFET
Application of plasma oxidation to strained-Si/SiGe MOSFET
Nishisaka, M. (Autor:in) / Asano, T. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 225-230
01.01.2005
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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