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The Influence of Methane Gas Pressure on the Optical, Electrical and Structural Properties of Nitrogenated Amorphous Carbon Films Grown by Surface Wave Microwave Plasma Chemical Vapor Deposition
The Influence of Methane Gas Pressure on the Optical, Electrical and Structural Properties of Nitrogenated Amorphous Carbon Films Grown by Surface Wave Microwave Plasma Chemical Vapor Deposition
The Influence of Methane Gas Pressure on the Optical, Electrical and Structural Properties of Nitrogenated Amorphous Carbon Films Grown by Surface Wave Microwave Plasma Chemical Vapor Deposition
Rusop, M. (Autor:in) / Omer, A. M. M. (Autor:in) / Adhikari, S. (Autor:in) / Adhikary, S. (Autor:in) / Mokutani, H. (Autor:in) / Hasegawa, N. (Autor:in) / Kato, S. (Autor:in) / Uchida, H. (Autor:in) / Soga, T. (Autor:in) / Jimbo, T. (Autor:in)
SURFACE REVIEW AND LETTERS ; 11 ; 553-558
01.01.2004
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
530.417
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