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Formation of microcrystalline germanium (mc-Ge:H) films from inductively coupled plasma CVD
Formation of microcrystalline germanium (mc-Ge:H) films from inductively coupled plasma CVD
Formation of microcrystalline germanium (mc-Ge:H) films from inductively coupled plasma CVD
Okamoto, Y. (Autor:in) / Makihara, K. (Autor:in) / Higashi, S. (Autor:in) / Miyazaki, S. (Autor:in)
APPLIED SURFACE SCIENCE ; 244 ; 12-15
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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