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Effect of Substrate Temperature on Crystal Orientation and Residual Stress in RF Sputtered Gallium Nitride Films
Effect of Substrate Temperature on Crystal Orientation and Residual Stress in RF Sputtered Gallium Nitride Films
Effect of Substrate Temperature on Crystal Orientation and Residual Stress in RF Sputtered Gallium Nitride Films
Kusaka, K. (Autor:in) / Hanabusa, T. (Autor:in) / Tominaga, K. (Autor:in) / Yamauchi, N. (Autor:in) / Denis, S. / Hanabusa, T. / He, B. / Mittemeijer, E. / Nan, J. / Noyan, I. C.
01.01.2005
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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